Skip to main content

Laser-induced oxidized zinc alloy films for direct-write grayscale photomasks

Resource type
Thesis type
(Thesis) M.A.Sc.
Date created
Author: Wang, Jun
Previous research showed laser-induced oxidization in Bi/In and Sn/In bimetallic films produced a large optical density change (3.00 to 0.22 OD at 365nm), making them promising in grayscale photomask application. This thesis explores Zn alloys as new bimetallic combinations. Sn/Zn, Zn/Sn, Al/Zn, Zn/Al, Bi/Zn, Zn/Bi and In/Zn were DC/RF-sputtering deposited and then exposed to an argon ion CW laser (spot size ≤ 10µm). Using a UV/Visible spectrometer, the most transparent material obtained was an exposed In/Zn film (3.20 to 0.20 OD). Zn/Sn, Zn/Al and Sn/Zn, producing a shallow OD versus laser power slope (5~9 OD/W) over a 0.4W power range while achieving a large OD range up to 3.45, gave the best results for laser direct-write grayscale photomasks. These bimetallic photomasks are able to pattern complex 3D microstructures by a single exposure. Using UV photolithography with these grayscale masks and SU-8 photoresist, 100µm high microbridges and 30°~60° V-grooves were fabricated.
Copyright statement
Copyright is held by the author.
The author has not granted permission for the file to be printed nor for the text to be copied and pasted. If you would like a printable copy of this thesis, please contact
Scholarly level
Member of collection
Download file Size
etd3363.pdf 48.24 MB

Views & downloads - as of June 2023

Views: 0
Downloads: 0