Resource type
Date created
2014-12-15
Authors/Contributors
Author (aut): Lee, Austin W. H.
Author (aut): Pilapil, Brandy K.
Author (aut): Ng, Him Wai
Author (aut): Gates, Byron D.
Abstract
We demonstrate the use of microwave radiation as a tool to accelerate the formation of perfluoroalkylsilane based self-assembled monolayers (SAMs) on silicon oxide surfaces. Surface coverage of these SAMs of monoreactive perfluoroalkylsilanes increased in proportion to the duration over which the solutions were heated by microwave radiation.
Document
Published as
"Microwave Assisted Formation of Monoreactive Perfluoroalkylsilane-based Self-Assembled Monolayers," Lee, W.; Kinkead, B.; Ng, H.W.; Gates, B.D., Chem. Commun., 2015, 51, 2060-2063. DOI: 10.1039/c4cc07494g.
Copyright statement
Copyright is held by the author(s).
Scholarly level
Peer reviewed?
Yes
Language
English
Member of collection
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